A02 Masaaki Haga
Masa-aki Haga |
Participating A02 |
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Affiliation |
Faculty of Applied Chemistry, Chuo University |
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Position |
Professor |
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Contact |
mhaga@kc.chuo-u.ac.jp |
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HP |
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Research Project |
Development of Molecular Memristor Devices by Heterojunction Based on Metal Complexes |
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Abstract |
We will construct surface heterojunction structures based on coordination network films and a proton conduction polymer toward molecular memristor devices. Since the heterojunction possesses surface asymmetric nanostructure, proton gradient by pKa values and potential gradient are introduced at the interface between two molecular component units. We have fabricated the coordination asymmetric heterolayer films by use of coordination bond between phosphonate groups on an ITO electrode. We will focus on the following subjects: (1) memoristor behavior of heterojunction composed of two different materials such as proton conducting metal-organic frameworks and metal oxides. We will also investigate how the rectification at the heterojunction by energy gap affects the proton-conduction between two coordination network film with different pKa values. (2) Photo charge storage devices on the hetero-junction films based on the luminescent Ru complex. (3) K+ ion gating on Prussian blue nanocrystals on an ITO modified with redox-active Ru complex. |
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Research Areas |
Surface coordination chemistry, Molecular device, Hetero-junction, Layer-by-layer films |
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Keywords |
Redox-active complexes. Layer-by-layer growth, Memristor, Charge storage, electrochemistry, two-terminal device |
2020
R.S.Vishwanath ; Masa-aki Haga; Takumi Watanabe; Emilia Witkowska Nery; Martin Jönsson-Niedziółka, Electrochimica Acta, 362, 137090, 2020
DOI: 10.1016/j.electacta.2020.137090.
2019
Hiroaki Sato; Mitsutoshi Ide; Ryo Saito; Takanari Togashi; Katsuhiko Kanaizuka; Masato Kurihara; Hiroshi Nishihara; Hiroaki Ozawa; Masa‐aki Haga, J. Mater. Chem. C, 7, 12491 - 12501, 2019
DOI: 10.1039/c9tc04192c.
2018
Wataru Harada; Mana Hirahara; Takanari Togashi; Manabu Ishizaki; Masato Kurihara; Masa-aki Haga; Katsuhiko Kanaizuka, Langmuir, 34, 4, 1321 - 1326, 2018
DOI: 10.1021/acs.langmuir.7b03466.
Shota Oka; Hiroaki Ozawa; Kai Yoshikawa; Tomiki Ikeda; Masa-aki Haga, Dalton Trans., 47, 40, 14195 - 14203, 2018
DOI: 10.1039/c8dt01573b.
Kai Yoshikawa; Daisuke Motoyama; Yusuke Hiruma; Hiroaki Ozawa; Shusaku Nagano; Masa-aki Haga, ACS Applied Materials & Interfaces, 10, 32, 26990 - 26700, 2018
DOI: 10.1021/acsami.8b05907.
Hiroaki Ozawa; Shunsuke Kusaba; Mariko Matsunaga; Masa-aki Haga, Langmuir, 2952 - 2958, 2018
DOI: 10.1021/acs.langmuir.7b03828.
Huseyin Atesci; Veerabhadrarao Kaliginedi; Jose A. Celis Gil; Hiroaki Ozawa; Joseph M. Thijssen; Peter Broekmann; Masa-aki Haga; Sense Jan van der Molen, Nat. Nanotechnol., 13, 117 - 121, 2018
DOI: 10.1038/s41565-017-0016-8.
2017
Ting-Ting Meng; Li Xin Xue; Hao Wang; Ke-Zhi Wang; Masa-aki Haga, J. Mater. Chem. C, 5, 13, 3390 - 3396, 2017
DOI: 10.1039/c7tc00494j.
Daisuke Motoyama; Kai Yoshikawa; Hiroaki Ozawa; Makoto Tadokoro; Masa-aki Haga, Inorg. Chem., 56, 11, 6419 - 6428, 2017
DOI: 10.1021/acs.inorgchem.7b00518.
Alexander V. Rudnev; Veerabhadrarao Kaliginedi; Andrea Droghetti; Hiroaki Ozawa; Akiyoshi Kuzume; Masa-aki Haga; Peter Broekmann; Ivan Runner, Sci. Adv., 3, 6, e1602297, 2017
DOI: 10.1126/sciadv.1602297.
Hiroaki Ozawa; Norihiko Katori; Tomomi Kita; Shota Oka; Masa-aki Haga, Langmuir, 33, 11901 - 11910, 2017
DOI: 10.1021/acs.langmuir.7b02194.
Junpei Kuwabara; Tomomi Namekawa; Eiko Sakabe; Masa-aki Haga; Takaki Kanbara, J. Organometal. Chem., 845, 189 - 195, 2017
DOI: 10.1016/j.jorganchem.2017.04.037.
Makoto Tadokoro; Hiroyuki Hosoda; Tomonori Inoue; Akira Murayama; Koichiro Noguchi; Atsushi Iioka; Ryota Nishimura; Masaki Itoh; Tomoaki Sugaya; Hajime Kamebuchi; Masa-aki Haga, Inorg. Chem., 56, 8513 - 8526, 2017
DOI: 10.1021/acs.inorgchem.7b01256.